| |
Design
Guidelines |
Pillar
Bumps
(with Eutectic or Lead-free cap) |
| 1 |
Bump
Shape |
Octagonal |
| 2 |
Pillar
Structure |
Copper
post + solder cap |
| 3 |
|
65
µm |
| 4 |
|
35
µm |
| 5 |
Total
Bump Height Co Planarity |
+/-
5 µm (in die), +/- 10µm (in water), +/- 15
µm (wf to wf) |
| 6 |
Bump
Pitch |
80
µm Minimum |
| 7 |
Bump
Spacing |
33
µm Minimum |
| 8 |
Bump
Pad to Pass. Overlap |
7
µm Per Side Minimum |
| 9 |
Bond
Pad to Pass. Opening |
14
µm Per Side Minimum |
| 10 |
Passivation
Type |
Nitride,
OxyNitride, Polyimide |
| 11 |
Incoming
Wafer Edge Exclusion Zone |
5
mm (from wafer edge) for 6" and 8" wafer |
| 12 |
Solder
Cap Material |
63Sn/37Pb
+/- 5%, 100Sn |
| 13 |
UBM
Material |
Ti
+ Cu |
| 14 |
Shear
Testing Height |
30
µm above wafer surface |
| 15 |
Shear
Strength |
>7.5
mgf/µm² for copper post |
| 16 |
Wall
angle |
83
degree for aligner, 87 degree for Ultratech Stepper |
| 17 |
Bump
Mask Design and Layout |
APS
In-House Design Capability: Require GDSII, Stepping Distance,
Wafer Map |